Patent Assignment Details
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| Reel/Frame: | 010869/0597 | |
| Pages: | 3 |
| | Recorded: | 06/07/2000 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/11/2001
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Application #:
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09511598
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Filing Dt:
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02/23/2000
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Title:
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Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor
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Assignee
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| 416 MAETAN-DONG, PALDAL-GU |
| SUWON-CITY, KYUNGKI-DO, KOREA, REPUBLIC OF |
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Correspondence name and address
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MYERS BIGEL SIBLEY & SAJOVEC
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MITCHELL S. BIGEL
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P.O. BOX 37428
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RALEIGH, NORTH CAROLINA 27627
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