Patent Assignment Details
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| Reel/Frame: | 006235/0598 | |
| Pages: | 5 |
| | Recorded: | 08/07/1992 | | |
| Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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08/31/1993
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Application #:
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07926754
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Filing Dt:
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08/07/1992
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Title:
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CHEMICAL VAPOR DEPOSITION TECHNIQUE FOR DEPOSITING TITANIUM SILICIDE ON SEMICONDUCTOR WAFERS
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Assignee
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| A CORP. OF DE |
| 2805 E. COLUMBIA ROAD |
| BOISE, IDAHO 83706-9698 |
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Correspondence name and address
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DANIEL L. HAYES
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WELLS, ST. JOHN, ROBERTS, GREGORY ET AL.
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WEST 601 MAIN AVENUE, SUITE 815
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SPOKANE, WASHINGTON 99201-0679
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