Patent Assignment Details
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Reel/Frame: | 006520/0824 | |
| Pages: | 4 |
| | Recorded: | 04/14/1993 | | |
Conveyance: | ASSIGNMENT OF ASSIGNORS INTEREST. |
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Total properties:
1
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Patent #:
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Issue Dt:
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09/21/1993
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Application #:
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08046685
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Filing Dt:
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04/14/1993
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Title:
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LOW-PRESSURE CHEMICAL VAPOR DEPOSITION PROCESS FOR DEPOSITING HIGH-DENSITY, HIGHLY-CONFORMAL, TITANIUM NITRIDE FILMS OF LOW BULK RESISTIVITY
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Assignee
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2805 E. COLUMBIA ROAD |
BOISE, IDAHO 83706 |
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Correspondence name and address
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ANGUS C. FOX, III
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MICRON SEMICONDUCTOR, INC.
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2805 E. COLUMBIA ROAD
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BOSIE, ID 83706
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