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Patent Assignment Abstract of Title
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Total Assignments: 1
Patent #:
5000113
Issue Dt:
03/19/1991
Application #:
06944492
Filing Dt:
12/19/1986
Inventors:
DAVID NIN-KOU WANG, JOHN M. WHITE, KAM S. LAW, CISSY LEUNG, SALVADOR P. UMOTOY et al
Title:
THERMAL CVD/PECVD REACTOR AND USE FOR THERMAL CHEMICAL VAPOR DEPOSITION OF SILICON DIOXIDE AND IN-SITU MULTI-STEP PLANARIZED PROCESS
Assignment: 1
Reel/Frame:
004696/0777Recorded: 03/11/1987Pages: 7
Conveyance:
ASSIGNMENT OF ASSIGNORS INTEREST.
Assignors:
WANG, DAVID NIN-KOU
Exec Dt:
02/13/1987
WHITE, JOHN M.
Exec Dt:
02/13/1987
LAW, KAM S.
Exec Dt:
02/13/1987
LEUNG, CISSY
Exec Dt:
02/23/1987
UMOTOY, SALVADOR P.
Exec Dt:
02/17/1987
COLLINS, KENNETH S.
Exec Dt:
02/13/1987
ADAMIK, JOHN A.
Exec Dt:
02/13/1987
PERLOV, ILYA
Exec Dt:
02/13/1987
MAYDAN, DAN
Exec Dt:
02/13/1987
Assignee:
APPLIED MATERIALS, INC.
A CORP. OF CA.
SANTA CLARA, CALIFORNIA
Correspondent:
FLEHR, HOHBACH, TEST,
ALBRITTON & HERBERT
STE. 3400, FOUR EMBARCADERO CTR.
SAN FRANCISCO, CA 94111

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