Patent Assignment Abstract of Title
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Total Assignments:
2
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Patent #:
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Issue Dt:
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01/21/2003
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Application #:
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09389788
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Filing Dt:
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09/03/1999
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Publication #:
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Pub Dt:
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04/25/2002
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Inventor:
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WILLIAM H MULLEE
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Title:
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REMOVAL OF PHOTORESIST AND PHOTORESIST RESIDUE FROM SEMICONDUCTORS USING SUPERCRITICAL CARBON DIOXIDE PROCESS
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Assignment:
1
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| 2339 TECHNOLOGY PARKWAY, SUITE A |
| HOLLISTER, CALIFORNIA 95023 |
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| HAVERSTOCK & OWENS LLP |
| THOMAS B. HAVERSTOCK |
| 260 SHERIDAN AVE., SUITE 420 |
| PALO ALTO, CA 94306 |
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Assignment:
2
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ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS).
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| MINATO-KU |
| AKASAKA 5-CHOME |
| TOKYO 107-8481, JAPAN |
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| HAVERSTOCK & OWENS LLP |
| THOMAS B. HAVERSTOCK |
| 260 SHERIDAN AVENUE, SUITE 420 |
| PALO ALTO, CA 94306 |
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