Total properties:
56
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Patent #:
|
|
Issue Dt:
|
09/03/1985
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Application #:
|
06561505
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Filing Dt:
|
12/15/1983
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Title:
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PROCESS FOR THE DEVELOPMENT OF RELIEF STRUCTURES BASED ON RADIATION- CROSSLINKED POLYMERIC PRECURSORS OF POLYMERS WHICH ARE RESISTANT TO HIGH TEMPERATURE
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Patent #:
|
|
Issue Dt:
|
04/14/1987
|
Application #:
|
06608754
|
Filing Dt:
|
05/10/1984
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Title:
|
PHOTOSENSITIVE POLYMERS AS COATING MATERIALS
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|
|
Patent #:
|
|
Issue Dt:
|
12/16/1986
|
Application #:
|
06608755
|
Filing Dt:
|
05/10/1984
|
Title:
|
POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE
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|
|
Patent #:
|
|
Issue Dt:
|
07/14/1987
|
Application #:
|
06732334
|
Filing Dt:
|
05/10/1985
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Title:
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HOMOPOLYMERS, COPOLYMERS AND COATED MATERIAL AND ITS USE
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|
|
Patent #:
|
|
Issue Dt:
|
12/16/1986
|
Application #:
|
06795591
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Filing Dt:
|
11/06/1985
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Title:
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A PROCESS FOR IRRADIATING POLYIMIDIES
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|
|
Patent #:
|
|
Issue Dt:
|
10/06/1987
|
Application #:
|
06796380
|
Filing Dt:
|
11/08/1985
|
Title:
|
POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE, AND TETRACARBOXYLIC ACIDS AND TETRACARBOXYLIC ACID DERIVATIVES
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|
|
Patent #:
|
|
Issue Dt:
|
10/20/1987
|
Application #:
|
06818950
|
Filing Dt:
|
01/15/1986
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Title:
|
POLYAMIDE ESTER PHOTORESIST FORMULATIONS OF ENHANCED SENSITIVITY
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|
|
Patent #:
|
|
Issue Dt:
|
07/12/1988
|
Application #:
|
06853102
|
Filing Dt:
|
04/17/1986
|
Title:
|
STABILIZED SOLUTIONS OF RADIATION-CROSSLINKABLE POLYMER PRECURSORS OF HIGHLY HEAT-RESISTANT POLYMERS
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|
|
Patent #:
|
|
Issue Dt:
|
08/09/1988
|
Application #:
|
06857663
|
Filing Dt:
|
04/30/1986
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Title:
|
NEGATIVELY OPERATING PHOTORESIST COMPOSITION, WITH RADIATION-ABSORBING ADDITIVES
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|
|
Patent #:
|
|
Issue Dt:
|
04/12/1988
|
Application #:
|
06859683
|
Filing Dt:
|
05/05/1986
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Title:
|
CYCLIC ACETALS OR KETALS OF BETA-KETO ESTERS OR AMIDES
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|
|
Patent #:
|
|
Issue Dt:
|
06/30/1987
|
Application #:
|
06895603
|
Filing Dt:
|
08/07/1986
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Title:
|
POLYIMIDES AND A PROCESS FOR THEIR PREPARATION
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|
|
Patent #:
|
|
Issue Dt:
|
11/22/1988
|
Application #:
|
06901095
|
Filing Dt:
|
08/27/1986
|
Title:
|
ADHESIVELY BONDED PHOTOSTRUCTURABLE POLYIMIDE FILM
|
|
|
Patent #:
|
|
Issue Dt:
|
04/11/1989
|
Application #:
|
07001309
|
Filing Dt:
|
01/08/1987
|
Title:
|
SUBSTITUTED O-PHTHALALDEHYDES
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|
|
Patent #:
|
|
Issue Dt:
|
03/29/1988
|
Application #:
|
07001312
|
Filing Dt:
|
01/08/1987
|
Title:
|
NOVEL ORGANOMETALLIC POLYMERS
|
|
|
Patent #:
|
|
Issue Dt:
|
11/08/1988
|
Application #:
|
07041889
|
Filing Dt:
|
04/22/1987
|
Title:
|
HOMOPOLYMERS, COPOLYMERS AND COATED MATERIAL AND ITS USE
|
|
|
Patent #:
|
|
Issue Dt:
|
07/11/1989
|
Application #:
|
07063881
|
Filing Dt:
|
06/19/1987
|
Title:
|
DIAMINO-9,10-DIHYDROANTHRACENES AND POLYAMIDE ACID (ESTERS) AND POLYIMIDES DERIVED THEREFROM
|
|
|
Patent #:
|
|
Issue Dt:
|
11/15/1988
|
Application #:
|
07064728
|
Filing Dt:
|
06/22/1987
|
Title:
|
RADIATION-SENSITIVE POLYCONDENSATES, PROCESSES FOR THEIR PREPARATION, COATED MATERIAL AND ITS USE
|
|
|
Patent #:
|
|
Issue Dt:
|
03/21/1989
|
Application #:
|
07067589
|
Filing Dt:
|
06/29/1987
|
Title:
|
MATERIAL COATED WITH POLYAMIC ACID ESTER
|
|
|
Patent #:
|
|
Issue Dt:
|
04/03/1990
|
Application #:
|
07070749
|
Filing Dt:
|
07/06/1987
|
Title:
|
POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE, AND TETRACARBOXYLIC ACIDS AND TETRACARBOXYLIC ACID DERIVATIVES
|
|
|
Patent #:
|
|
Issue Dt:
|
04/03/1990
|
Application #:
|
07070750
|
Filing Dt:
|
07/06/1987
|
Title:
|
POLYIMIDES, A PROCESS FOR THEIR PREPARATION AND THEIR USE, AND TETRACARBOXYLIC ACIDS AND TETRACARBOXYLIC ACID DERIVATIVES
|
|
|
Patent #:
|
|
Issue Dt:
|
08/16/1988
|
Application #:
|
07099373
|
Filing Dt:
|
09/11/1987
|
Title:
|
RADIATION-SENSITIVE POLYCONDENSATES, THEIR PREPARATION, MATERIAL COATED THEREWITH AND THE USE THEREOF
|
|
|
Patent #:
|
|
Issue Dt:
|
10/03/1989
|
Application #:
|
07099880
|
Filing Dt:
|
09/22/1987
|
Title:
|
POSITIVE O - QUINONE DIAZIDE PHOTORESIST COMPOSITION WITH A BIS - BENZOTRIAZOLE
|
|
|
Patent #:
|
|
Issue Dt:
|
05/30/1989
|
Application #:
|
07105379
|
Filing Dt:
|
10/07/1987
|
Title:
|
1,2-NAPHTHOQUINONE DIAZIDE SULFONYL ESTER COMPOUND WITH LINKING BENZOTRIAZOLE GROUPS AND LIGHT-SENSITIVE COMPOSITION WITH COMPOUND
|
|
|
Patent #:
|
|
Issue Dt:
|
02/28/1989
|
Application #:
|
07115544
|
Filing Dt:
|
10/28/1987
|
Title:
|
AMINO-TETRAALKYLBENZOYLPHTHALIC ACIDS
|
|
|
Patent #:
|
|
Issue Dt:
|
02/21/1989
|
Application #:
|
07125668
|
Filing Dt:
|
11/27/1987
|
Title:
|
CYCLIC ACETALS OR KETALS OF 8-KETO ESTERS OR AMIDES
|
|
|
Patent #:
|
|
Issue Dt:
|
07/25/1989
|
Application #:
|
07135813
|
Filing Dt:
|
12/21/1987
|
Title:
|
PHOTOSTRUCTURABLE POLYIMIDE MIXTURES
|
|
|
Patent #:
|
|
Issue Dt:
|
06/19/1990
|
Application #:
|
07231323
|
Filing Dt:
|
08/12/1988
|
Title:
|
ADHESIVELY BONDED PHOTOSTRUCTURABLE POLYIMIDE FILM
|
|
|
Patent #:
|
|
Issue Dt:
|
05/15/1990
|
Application #:
|
07281429
|
Filing Dt:
|
12/08/1988
|
Title:
|
AUTO-PHOTOCROSSLINKABLE COPOLYIMIDES AND POLYIMIDE COMPOSITIONS
|
|
|
Patent #:
|
|
Issue Dt:
|
12/25/1990
|
Application #:
|
07308483
|
Filing Dt:
|
02/10/1989
|
Title:
|
PROCESS FOR THE PREPARATION OF 1,2-DISULFONE COMPOUNDS
|
|
|
Patent #:
|
|
Issue Dt:
|
04/14/1992
|
Application #:
|
07430760
|
Filing Dt:
|
11/02/1989
|
Title:
|
POSITIVE PHOTORESIST COMPOSITION CONTAINING RADIATION SENSITIVE QUINONEDIAZIDE COMPOUND AND COMPLETELY ESTERIFIED POLYAMIC ACID POLYMER
|
|
|
Patent #:
|
|
Issue Dt:
|
12/31/1991
|
Application #:
|
07467622
|
Filing Dt:
|
01/19/1990
|
Title:
|
DISUBSTITUTED AROMATIC DIANHYDRIDES
|
|
|
Patent #:
|
|
Issue Dt:
|
10/06/1992
|
Application #:
|
07467710
|
Filing Dt:
|
01/19/1990
|
Title:
|
POLYIMIDES PREPARED FROM DISUBSTITUTED AROMATIC TETRACARBOXYLIC ACID DIANHYDRIDES
|
|
|
Patent #:
|
|
Issue Dt:
|
04/07/1992
|
Application #:
|
07487563
|
Filing Dt:
|
03/02/1990
|
Title:
|
AUTO-PHOTOCROSSLINKABLE COPOLYIMIDES AND POLYIMIDE COMPOSITIONS
|
|
|
Patent #:
|
|
Issue Dt:
|
04/21/1992
|
Application #:
|
07648954
|
Filing Dt:
|
02/01/1991
|
Title:
|
POSITIVE PHOTORESIST COMPOSITION CONTAINING ALKALI-SOLUBLE PHENOLIC RESIN, PHOTOSENSITIVE QUINONEDIAZIDE COMPOUND AND SULFONYL CONTAINING COMPOUND
|
|
|
Patent #:
|
|
Issue Dt:
|
12/31/1991
|
Application #:
|
07649271
|
Filing Dt:
|
01/30/1991
|
Title:
|
POSITIVE PHOTORESIST CONTAINING 2,3,4-TRIHYDROXYBENZOPHENONE AND 1,2-NAPHTHOQUINONE-DIAZIDE-5-SULFONYL TRISESTER OF 1,3,5-TRIHYDROXY- BENZENE
|
|
|
Patent #:
|
|
Issue Dt:
|
12/24/1991
|
Application #:
|
07662395
|
Filing Dt:
|
02/27/1991
|
Title:
|
DESENSITIZED QUINONE DIAZIDE COMPOUNDS UTILIZING MICROCRYSTALLINE CELLULOSE AS DESENSITIZING AGENT
|
|
|
Patent #:
|
|
Issue Dt:
|
08/02/1994
|
Application #:
|
07692811
|
Filing Dt:
|
04/25/1991
|
Title:
|
POSITIVE DIAZO QUINONE PHOTORESIST COMPOSITIONS CONTAINING ANTIHALATION COMPOUND
|
|
|
Patent #:
|
|
Issue Dt:
|
04/21/1992
|
Application #:
|
07731188
|
Filing Dt:
|
07/15/1991
|
Title:
|
BENZOATES CONTAINING A SUBSTITUENT HAVING OLEFINIC UNSATURATION
|
|
|
Patent #:
|
|
Issue Dt:
|
05/11/1993
|
Application #:
|
07756631
|
Filing Dt:
|
09/09/1991
|
Title:
|
ACID LABILE DISSOLUTION INHIBITORS AND POSITIVE- AND NEGATIVE-ACTING PHOTOSENSITIVE COMPOSITION BASED THEREON
|
|
|
Patent #:
|
|
Issue Dt:
|
06/15/1993
|
Application #:
|
07771088
|
Filing Dt:
|
10/02/1991
|
Title:
|
POSITIVE PHOTORESIST CONTAINING 1,2-NAPHTHOQUINONE-DIAZIDE-5-SULFONYL TRIS ESTER OF 1,3,5-TRIHYDROXYBENZENE AND AROMATIC HYDROXY COMPOUND SENSITIZER
|
|
|
Patent #:
|
|
Issue Dt:
|
04/06/1993
|
Application #:
|
07793494
|
Filing Dt:
|
11/14/1991
|
Title:
|
PHOTORESIST COMPOSITION CONTAINING SPECIFIC AMOUNTS OF A NAPHTHO- QUINONE DIAZIDE SULFONYL ESTER OF TETRAHYDROXY DIPHENYL SULFIDE AND A POLYHYDROXY COMPOUND
|
|
|
Patent #:
|
|
Issue Dt:
|
11/24/1992
|
Application #:
|
07831119
|
Filing Dt:
|
02/04/1992
|
Title:
|
BENZOATES CONTAINING A SUBSTITUENT HAVING OLEFINIC UNSATURATION
|
|
|
Patent #:
|
|
Issue Dt:
|
12/28/1993
|
Application #:
|
07843798
|
Filing Dt:
|
02/27/1992
|
Title:
|
COPOLYMERS CROSSLINKABLE BY ACID CATALYSIS
|
|
|
Patent #:
|
|
Issue Dt:
|
08/24/1993
|
Application #:
|
07843799
|
Filing Dt:
|
02/27/1992
|
Title:
|
PHOTOSENSITIVE COMPOSITIONS BASED ON POLYPHENOLS AND ACETALS
|
|
|
Patent #:
|
|
Issue Dt:
|
03/22/1994
|
Application #:
|
07932128
|
Filing Dt:
|
08/15/1992
|
Title:
|
POSITIVE PHOTORESISTS CONTAINING QUINONE DIAZIDE PHOTOSENSITIZER, ALKALI-SOLUBLE RESIN AND TETRA(HYDROXYPHENYL) ALKANE ADDITIVE
|
|
|
Patent #:
|
|
Issue Dt:
|
10/18/1994
|
Application #:
|
07979498
|
Filing Dt:
|
11/20/1992
|
Title:
|
RADIATION-SENSITIVE COMPOSITIONS
|
|
|
Patent #:
|
|
Issue Dt:
|
01/10/1995
|
Application #:
|
08007420
|
Filing Dt:
|
01/22/1993
|
Title:
|
ACID LABILE SOLUTION INHIBITORS AND POSITIVE- AND NEGATIVE-ACTING PHOTOSENSITIVE COMPOSITION BASED THEREON
|
|
|
Patent #:
|
|
Issue Dt:
|
01/10/1995
|
Application #:
|
08040230
|
Filing Dt:
|
03/30/1993
|
Title:
|
PHENYLACETATES AND THE USE THEREOF
|
|
|
Patent #:
|
|
Issue Dt:
|
06/28/1994
|
Application #:
|
08051720
|
Filing Dt:
|
04/22/1993
|
Title:
|
PHOTORESIST MATERIAL BASED ON POLYSTRYENES
|
|
|
Patent #:
|
|
Issue Dt:
|
07/25/1995
|
Application #:
|
08180180
|
Filing Dt:
|
01/11/1994
|
Title:
|
POSITIVE PHOTORESISTS WITH ENHANCED RESOLUTION AND REDUCED CRYSTALLISATION CONTAINING NOVEL TETRA(HYDROXYPHENYL)ALKANES
|
|
|
Patent #:
|
|
Issue Dt:
|
03/21/1995
|
Application #:
|
08209090
|
Filing Dt:
|
03/10/1994
|
Title:
|
MODULE IN AN INTEGRATED DELIVERY SYSTEM FOR CHEMICAL VAPORS FROM LIQUID SOURCES
|
|
|
Patent #:
|
|
Issue Dt:
|
03/21/1995
|
Application #:
|
08227831
|
Filing Dt:
|
04/14/1994
|
Title:
|
A PROCESS OF PHOTOPATTERNING A SUBSTRATE WITH A POSITIVE PHOTORESIST COMPOSITION CONTAINING A DIAZOQUINONE PHOTOSENSITIZER
|
|
|
Patent #:
|
|
Issue Dt:
|
03/14/1995
|
Application #:
|
08249972
|
Filing Dt:
|
05/27/1994
|
Title:
|
POSITIVE PHOTORESIST HAVING IMPROVED PROCESSING PROPERTIES
|
|
|
Patent #:
|
|
Issue Dt:
|
12/19/1995
|
Application #:
|
08323482
|
Filing Dt:
|
10/14/1994
|
Title:
|
PHENYLACETATES AND THEIR USE IN RADIATION SENSITIVE COMPOSITIONS
|
|
|
Patent #:
|
|
Issue Dt:
|
09/24/1996
|
Application #:
|
08358131
|
Filing Dt:
|
12/16/1994
|
Title:
|
PHOTORESIST COMPOSITIONS CONTAINING COPOLYMERS HAVING ACID-LABILE GROUPS AND RECURRING UNITS DERIVED FROM EITHER N-(HYDROXYMETHYL)MALEIMIDE OR N-(ACETOXYMETHYL)MALEIMIDE OR BOTH
|
|
|
Patent #:
|
|
Issue Dt:
|
09/10/1996
|
Application #:
|
08399686
|
Filing Dt:
|
03/07/1995
|
Title:
|
TETRA(HYDROXPHENYL)ALKANES
|
|