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Total properties:
30
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Patent #:
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|
Issue Dt:
|
03/31/1987
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Application #:
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06784739
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Filing Dt:
|
10/07/1985
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Title:
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METHOD AND APPARATUS FOR SUBSTRATE HEATING IN AN AXIALLY SYMMETRIC EPITAXIAL DEPOSITION APPARATUS
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Patent #:
|
|
Issue Dt:
|
12/06/1988
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Application #:
|
07031519
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Filing Dt:
|
03/27/1987
|
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Title:
|
METHOD AND APPARATUS FOR SUBSTRATE HEATING IN AN AXIALLY SYMMETRIC EPITAXIAL DEPOSITION APPARATUS
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|
|
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Patent #:
|
|
Issue Dt:
|
04/18/1989
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Application #:
|
07032474
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Filing Dt:
|
03/31/1987
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Title:
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ROTATABLE SUBSTRATE SUPPORTING MECHANISM WITH TEMPERATURE SENSING DEVICE FOR USE IN CHEMICAL VAPOR DEPOSITION EQUIPMENT
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|
|
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Patent #:
|
|
Issue Dt:
|
06/06/1989
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Application #:
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07063409
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Filing Dt:
|
06/18/1987
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Title:
|
HEATING SYSTEM FOR REACTION CHAMBER OF CHEMICAL VAPOR DEPOSITION EQUIPMENT
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|
|
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|
Patent #:
|
|
Issue Dt:
|
06/22/1993
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Application #:
|
07066019
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Filing Dt:
|
06/24/1987
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|
Title:
|
IMPROVED GAS INJECTORS FOR REACTION CHAMBERS IN CVD SYSTEMS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
05/09/1989
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Application #:
|
07108771
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Filing Dt:
|
10/15/1987
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|
Title:
|
CHEMICAL VAPOR DEPOSITION SYSTEM
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|
|
|
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Patent #:
|
|
Issue Dt:
|
01/17/1989
|
Application #:
|
07147100
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Filing Dt:
|
01/25/1988
|
|
Title:
|
APPARATUS AND METHOD FOR CHEMICAL VAPOR DEPOSITION USING AN AXIALLY SYMMETRIC GAS FLOW
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/17/1989
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Application #:
|
07167347
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Filing Dt:
|
03/14/1988
|
|
Title:
|
PROCESS FOR EPITAXIAL DEPOSITION OF SILICON
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/03/1992
|
Application #:
|
07315332
|
Filing Dt:
|
02/24/1989
|
|
Title:
|
SUBSTRATE LOADING APPARATUS FOR A CVD PROCESS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/04/1991
|
Application #:
|
07315723
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Filing Dt:
|
02/24/1989
|
|
Title:
|
SUBSTRATE HANDLING AND TRANSPORTING APPARATUS
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|
|
|
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Patent #:
|
|
Issue Dt:
|
12/04/1990
|
Application #:
|
07319260
|
Filing Dt:
|
03/03/1989
|
|
Title:
|
HEATING SYSTEM FOR SUBSTRATES
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/17/1992
|
Application #:
|
07329778
|
Filing Dt:
|
03/28/1989
|
|
Title:
|
METHOD FOR IMPROVING THE REACTANT GAS FLOW IN A REACTION CHAMBERS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/05/1991
|
Application #:
|
07330200
|
Filing Dt:
|
03/29/1989
|
|
Title:
|
ROTATABLE SUBSTRATE SUPPORTING SUSCIPTOR WITH TEMPERATURE SENSORS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
02/19/1991
|
Application #:
|
07339310
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Filing Dt:
|
04/17/1989
|
|
Title:
|
SUSCEPTOR WITH TEMPERATURE SENSING DEVICE
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/03/1991
|
Application #:
|
07468630
|
Filing Dt:
|
01/23/1990
|
|
Title:
|
APPARATUS FOR IMPROVING THE REACTANT GAS FLOW IN A REACTION CHAMBER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/02/1992
|
Application #:
|
07539062
|
Filing Dt:
|
06/15/1990
|
|
Title:
|
DRIVE SHAFT APPARATUS FOR A SUSCEPTOR
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
01/14/1992
|
Application #:
|
07547463
|
Filing Dt:
|
07/02/1990
|
|
Title:
|
WAFER HANDLING SYSTEM WITH BERNOULLI PICK-UP
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/07/1994
|
Application #:
|
07655731
|
Filing Dt:
|
02/14/1991
|
|
Title:
|
SUBSTRATE SUPPORTING APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
03/30/1993
|
Application #:
|
07664867
|
Filing Dt:
|
03/04/1991
|
|
Title:
|
ROTATABLE SUBSTRATE SUPPORTING MECHANISM WITH TEMPERATURE SENSING DEVICE FOR USE IN CHEMICAL VAPOR DEPOSITION EQUIPMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
09/14/1993
|
Application #:
|
07695410
|
Filing Dt:
|
05/03/1991
|
|
Title:
|
APPARATUS FOR IMPROVING THE REACTANT GAS FLOW IN A REACTION CHAMBER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/20/1992
|
Application #:
|
07720750
|
Filing Dt:
|
06/25/1991
|
|
Title:
|
METHOD FOR LOADING A SUBSTRATE INTO A CVD APPARATUS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
05/02/1995
|
Application #:
|
07782060
|
Filing Dt:
|
12/16/1991
|
|
Title:
|
GAS INJECTORS FOR REACTION CHAMBERS IN CVD SYSTEMS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/28/1994
|
Application #:
|
07819098
|
Filing Dt:
|
01/09/1992
|
|
Title:
|
WAFER HANDLING SYSTEM WITH BERNOULLI PICK-UP
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/27/1995
|
Application #:
|
07882309
|
Filing Dt:
|
05/13/1992
|
|
Title:
|
ROTATABLE SUBSTRATE SUPPORTING MECHANISM WITH TEMPERATURE SENSING DEVICE FOR USE IN CHEMICAL VAPOR DEPOSITION EQUIPMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/16/1993
|
Application #:
|
07882844
|
Filing Dt:
|
05/14/1992
|
|
Title:
|
REACTION CHAMBERS FOR CVD SYSTEMS
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|
|
|
|
Patent #:
|
|
Issue Dt:
|
12/20/1994
|
Application #:
|
08133659
|
Filing Dt:
|
10/07/1993
|
|
Title:
|
ROTATABLE SUBSTRATE SUPPORTING MECHANISM WITH TEMPERATURE SENSING DEVICE FOR USE IN CHEMICAL VAPOR DEPOSITION EQUIPMENT
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
10/17/1995
|
Application #:
|
08171265
|
Filing Dt:
|
12/21/1993
|
|
Title:
|
GAS INJECTORS FOR REACTION CHAMBERS IN CVD SYSTEMS
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
07/25/1995
|
Application #:
|
08255114
|
Filing Dt:
|
06/07/1994
|
|
Title:
|
CHEMICAL VAPOR DESPOSITION SYSTEM
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
11/12/1996
|
Application #:
|
08451926
|
Filing Dt:
|
05/26/1995
|
|
Title:
|
METHOD OF MAKING A QUARTZ DOME REACTOR CHAMBER
|
|
|
|
|
Patent #:
|
|
Issue Dt:
|
06/11/1996
|
Application #:
|
08514420
|
Filing Dt:
|
08/11/1995
|
|
Title:
|
GAS INJECTORS FOR REACTION CHAMBERS IN CVD SYSTEMS
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|
